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● Magnetic Enhanced Cathodic Arc Source

  StarArc Product Conventional Product
Target Material Ionization Rate
 Near 100% 80%
Target Material Usage Percentage
 40% 15%
Cooling Effect
 Excellent -

● Magnetron Sputtering Source

  StarArc Product Conventional Product
Deposition Uniformity
 ±5% ±10%
Target Material Usage Percentage
 50% 20%
Structure Design
 Reasonable Compact -

● Anode Layer Ion Beam Source

  StarArc Product Conventional Product
Ion Energy
 2000eV 1600 eV
Etching / Deposition Uniformity
 ±5%
      ±10%
Application
Cleaning, Ion Beam Assistant Sputtering, Reactive PVD Deposition
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Power Supply
 Single DC Power Supply -

 

● Customized design on vacuum system

● Other vacuum coating equipment and associated vacuum equipments’ build up, retrofitting

● Turn key coating centre project

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